P-300 Advanced ALD System

P-series Atomic Layer Deposition (ALD) systems set a new standard for ALD production tools, providing extremely fast process times and very low cost of ownership with the patented design solely based on the requirements of the ALD method. The reactor design is optimized for efficient processing of batches - 200wafers/run of 156mm x 156mm wafers, 27 wafers/run of 200mm wafers, 10 wafers/run of 300mm wafers, 20 wafers/run of 300mm x 300mm glass substrates. Batches of 3D, powder and through-porous/high aspect ratio samples can also be performed.