The VISION 420 RIE (Reactive Ion Etch) provides etching capabilities over a variety of materials and substrates for non-caustic etching (primarily Fluorine based). The small footprint, low cost, ease of use and superior performance makes the Vision 420 an ideal candidate for a wide range of uniform, high quality films serving R&D, prototyping, pilot line and low volume production. The high volume loading allows production for numerous applications such as LED, MEMs, and wireless manufacturing The 420 is found in production lines, universities and R&D labs worldwide. The reliable hardware and easy to use CORTEX® operating software makes the Vision 420 ideal for researchers and production alike. The extensive experience and large process library enable the users to ‘hit the ground running’ for any RIE etching requirement.