KOBUS Fast Atomic Sequential Technology (F.A.S.T.®)
Plasma-Therm's KOBUS product line offers a dedicated solution for single wafer deposition utilizing F.A.S.T. and PECVD technologies for both R&D and production customers.
Fast Atomic Sequential Technology (F.A.S.T.®)
Based on proprietary CVD reactor design, combined with pulsed capability, F.A.S.T.® is optimal for thick and conformal layer deposition and offers new solutions for 3D integration challenges.
At the crossroads of CVD and ALD deposition techniques, F.A.S.T.® delivers:
Unique film properties
Best in class solution for thick and conformal layers
ALD film performance at CVD speed