Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system.
Semiconductors, MEMS/NEMS, Solar Cells, Photonics, Optics, Failure Analysis, R&D, Prototyping