P-1000 Pro ALD System
P-series Atomic Layer Deposition (ALD) systems set a new standard for ALD production tools, providing extremely fast process times and very low cost of ownership with the patented design solely based on the requirements of the ALD method. The reactor design is optimized for efficient processing of batches - 1000 wafers/run of 156mm x 156mm wafers, 12x25 wafers/run of 200mm wafers, 80 wafers/run of 300mm wafers, 40 wafers/run of 450mm wafers, 4 wafers/run of 680mm x 540mm x 14mm plates. Batches of 3D, powder and through-porous/high aspect ratio samples can also be performed - Maximum size of 3D sample: 450mm x 450mm x 650mm.