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R-200 Standard ALD System

Atomic Layer Deposition (ALD) R-series reactors are optimized for Research, Product Development and Pilot production. The versatile reactor design enables deposition single sample as well as mini-batch processing option on 2-8'' (50-200 mm) wafers, 156mmx156mm Solar Si wafers, 3-dimensional objects, Powders and Particles, through-porous and high Aspect ratio samples. The R-200 Standard systems have the ability to perform Thermal ALD from 50degC to 500degC (higher temperature available on request), has 4 separate inlet lines and capable of handling up to 6 different sources at the same time. Systems can also be fitted with Loadlock if desired.