Plasma-Therm’s VERSALINE HDPCVD product is a new approach to achieving highly dense and conformal films at low substrate temperatures. The system utilizes a high-density ICP plasma with a temperature-controlled and biased substrate. Uniform gas injection at the substrate level maximizes film quality.
Semiconductors, MEMS/NEMS, Solar Cells, Photonics, Optics, Failure Analysis, R&D, Prototyping