Plasma-Therm’s VERSALINE PECVD is the result of decades of technological innovation. VERSALINE PECVD systems can deposit many different high-quality films, delivering maximum productivity with low total cost of ownership. The parallel plate configuration of VERSALINE PECVD is designed to provide a clean processing environment and require little maintenance.
Semiconductors, MEMS/NEMS, Solar Cells, Photonics, Optics, Failure Analysis, R&D, Prototyping