VISION 310 PECVD
The Vision 310 PECVD (Plasma Enhanced Chemical Vapor Deposition) is a fundamental deposition system for semiconductor fabrication and material science facilities. Used in R&D and low volume production applications, the classic parallel plate configuration provides a wide range of high quality, uniform films. Simple installation and operation, reliable hardware and software suite, coupled with a small footprint, make the Vision 310 PECVD the most cost effective turnkey solution in its class.