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The Vision 410 PECVD (Plasma Enhanced Chemical Vapor Deposition) is a film deposition system for R&D, open load production for semiconductor fabrication and material science research. The small footprint, low cost, ease of use and superior performance makes the Vision 410 an ideal candidate for a wide range of uniform, high quality films. The quality is built into the system and installation time is minimized with easy, clear and concise instructions to get the tool operational. The reliable hardware and easy to use CORTEX® operating software makes the Vision 410 ideal for researchers and production alike.